TU/Eindhoven (M. Creatore and E. Kessels) joins the consortium with consolidated expertise in the field of low temperature ALD processes of functional and barrier layers for thin film (silicon and CIGS) and crystalline silicon solar cells and flexible electronics.
The TU/e researchers will investigate several ultra-thin metal oxide layers synthesized by means of atomic layer deposition. The aim of the study is to passivate the surface of the nano-structured Bi2S3 and to encapsulate the electron acceptor against anodic corrosion via the electrolyte, yet without compromising the rate of electron tunneling from the dye to the semiconductor.
The research activities will take place in the Plasma and Materials Processing group- PMP- (www.phys.tue.nl/PMP). The PMP research groups, led by Prof. Kessels, focuses on the science and technology of plasma processing and (low substrate temperature) atomic layer deposition. The scientific objective of the group is to obtain "atomic" level understanding of (ultra-)thin film growth. These studes play a key role in the present research activities of PMP in the fields of nanoelectronics, flexible electronics and solar energy. In particular, the research in the field of solar cells covers the areas of crystalline and heterojunction silicon, thin film silicon, CIGS and dye-sensitized solar cells
ERWIN KESSELS (1973) received his M.Sc. and Ph.D. degree (cum laude) in Applied Physics from the Eindhoven University of Technology (The Netherlands) in 1996 and 2000, respectively. His doctoral thesis work, which was partly carried out at the University of California Santa Barbara, was an experimental study of the plasma deposition process of amorphous silicon films. In 1999 he was the recipient of the John Coburn and Harold Winters Student Award of the AVS' Plasma Science and Technology Division. In his postdoc period Erwin worked on plasma-surface interaction at the Colorado State University and on nonlinear surface spectroscopy at the Philipps University in Marburg (Germany). In 2002 Erwin was awarded a fellowship by the Royal Netherlands Academy of Arts and Sciences and he joined the Department of Applied Physics of the Eindhoven University of Technology as an assistant professor. His work covers the field of (plasma-based) synthesis of ultrathin films, nanostructures, and devices using methods such as plasma-enhanced chemical vapor deposition, atomic layer deposition, and plasma etching. His research involves the development of new (plasma-based) vapor-phase deposition techniques and processes for a wide variety of applications such as solar cells, nanoelectronics, energy storage, and display technology. This work is carried out in collaboration with several industrial partners such as FEI Company, NXP Semiconductors, OTB Solar, Philips, IMEC, Q-Cells, ASM International and Oxford Instruments. The research is complemented by fundamental studies of the surface reactions during materials processing by using beam studies under ultrahigh vacuum conditions and (newly-developed) advanced surface-sensitive diagnostics and nonlinear surface spectroscopy. In 2005, he spent 6 months at the University of California Berkeley for a sabbatical leave. In 2007, he was awarded the Peter Mark Award by the AVS Science and Technology "for pioneering work in the application and development of in situ plasma and surface diagnostics to achieve a molecular understanding of thin film growth ". Since 2008, he holds a associated professorship at the Eindhoven University of Technology. In 2010, he was awarded a prestigious NWO Vici grant (1.5 MEuro) to set up an independent research program on "nanomanufacturing" in order to bridge the gap between nanoscience/nanotechnology and industrial application.
Go to the Research Group's Website
Mariadriana Creatore has received her M.Sc. in Chemistry and Ph.D. degree in Chemical Sciences from the University of Bari (Italy) in 1997 and 2001, respectively. Her research involved the polymer surface modification and deposition of inorganic thin films by means of low-pressure plasmas. She carried out part of her master and doctoral thesis works at the Université Pierre et Marie Curie (Paris, France) and at the Ecole Polytechnique Federale de Lausanne (Lausanne, Switzerland).
After her Doctorate, she joined the Plasma and Materials Processing group at the Applied Physics department of the Eindhoven University of Technology. She was a Marie Curie postdoc fellow (2001-2003), within the Fifth Framework Programme (FP5) of the European Commission. In 2004 she was awarded a 3-years grant, VENI, by the NWO (Netherlands Organization for Scientific Research) within the Innovational Research Incentives Scheme programme. In 2006 she spent 3 months at the University of Oxford (Great Britain) for a sabbatical leave.
In May 2007 she has been appointed as an assistant professor and Sustainable Energy Technology (SET) fellow in Solar Energy at the Applied Physics department of the Eindhoven University of Technology. Her work presently covers the field of low pressure and atmospheric pressure plasma deposition of thin organic and inorganic films, complemented by fundamental studies of plasma-polymer surface interaction and inorganic/organic interphase generation and amorphous and crystalline thin film growth by means of in situ real time surface diagnostics for a wide variety of applications such as thin film solar cells, flexible electronics and other functional coatings. Next to the educational tasks within TU/e, she is also lecturer of the Solar Energy module for the course Advanced Renewable Energy System Technology (MJ2492) at KTH-Royal Institute of Technology, Stockholm, Sweden. She presently collaborates with other Dutch universities, several industrial partners and research institutes such as TU/Delft, Utrecht University, Fuji Film, Helianthos/Nuon, Scheuten Solar, OTB Display, Holst Centre, Philips Research, Hauzer Techno Coating, Bekaert, Dutch Polymer Institute, TNO and ECN.
Go to the Research Group's Website